[仿真]Numerical simulation of microwave field distribution for bifocal plasma sources

Abstract _U/CG<n  
In this paper calculations of the electric field distribution are presented with regard to the development of new plasma sources with ]^?V8*zL]  
bifocal structures. These structures facilitate the separation of microwave emission and microwave concentration. Similar to a focusing D-4\AzIb  
optical mirror this approach leads to a concentration of wave energy in a focus region where the plasma can be ignited and ro*$OLc/  
maintained. Hp?uYih0  
The validity of this approach for microwaves at 2.45 GHz in dependence on geometry and configuration of the structure and the Y#aHGZ$i  
possibility of a linear extension was examined through the following steps: starting with a rectangular waveguide that was CHNIL^B  
elliptically bulged to a bifocal structure in several scales, the same structure was stacked with a passageway in between. A complete _#rE6./@q  
removal of inner partitions was examined and finally the influence of a plasma-like absorber in the focus region. The result is a ^ G@o} Z  
microwave concentration near the focus points and the structures are linearly extendable without bothering crosstalk or other side ZsepTtY  
effects. !L\P.FP7b  
D 2005 Elsevie .. UA$Xa1  
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