[有源]83 PULSED-POWER APPLICATIONS TO MATERIALS SCIENCE

PULSED-POWER APPLICATIONS TO MATERIALS SCIENCE S7f"\[Aw  
Kiyoshi Yatsui,* Weihua Jiang, Hisayuki Suematsu, Tsuneo Suzuki, )F65sV{  
Fumito Endo, Chuhyun Cho, and Tunetoshi Arikado r>Cv@4/j  
Extreme Energy Density Research Institute (EDI), Nagaoka university of Technology, z-G*:DfgH  
Nagaoka, Niigata 940-2188, Japan bPUldkB:  
Abstract |rwx;+  
It is known that an intense pulsed ion beam interaction ;QqC c!b  
with solid targets is able to produce high-density ablation Be~In~~  
plasma due to its short range. Efficient preparation of =L&dV]'4P  
thin films has been succeeded very quickly, without NNn sq@?6  
heating the substrate during the deposition, called pulsed 0W!S.]^1  
ion-beam evaporation (IBE). By the rapid cooling of 'NSfGC%7R  
the ablation plasma produced by IBE with the ambient #55_hY#  
gas, ultrafine nanosize powders (UNP) has been 734<X6^1  
successfully synthesized as well. The UNPs have also _8&a%?R@W  
been produced by pulsed wire discharge (PWD). For C
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the practical applications, highly repetitive pulsed power bguTWI8bk  
generators have been developed using semiconductor *TC#|5  
switches such as MOS-FET, IGBT, and SI Thyristor. v#b(0G  
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14th IEEE International Power Conference全文数据，part 01 - part 16 E4qQ  
http://www.rayfile.com/files/089ddb14-a63a-11dd-975a-0014221b798a/ e(Y5OTus  
http://www.rayfile.com/files/4a3ec10a-a63a-11dd-9338-0014221b798a/ a}5/?/  
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[url=http://www.rayfile.com/files/d416c914-a63c-11dd-89a6-0019d11a795f/]http://www.rayfile.co .. _<6B.{$\7m  
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