[有源]83 PULSED-POWER APPLICATIONS TO MATERIALS SCIENCE

PULSED-POWER APPLICATIONS TO MATERIALS SCIENCE y&+Sp/6BYA  
Kiyoshi Yatsui,* Weihua Jiang, Hisayuki Suematsu, Tsuneo Suzuki, ]}dAm S/  
Fumito Endo, Chuhyun Cho, and Tunetoshi Arikado !:Clzlg  
Extreme Energy Density Research Institute (EDI), Nagaoka university of Technology, 6w^Fee`>]  
Nagaoka, Niigata 940-2188, Japan +jX.::UPm  
Abstract u\|Ys  
It is known that an intense pulsed ion beam interaction (Y]G6> Oa  
with solid targets is able to produce high-density ablation =%oKYQ  
plasma due to its short range. Efficient preparation of }4"T# [n#  
thin films has been succeeded very quickly, without Hsz).u  
heating the substrate during the deposition, called pulsed MM4Eq>F/  
ion-beam evaporation (IBE). By the rapid cooling of d<4q%y'X{  
the ablation plasma produced by IBE with the ambient 8Wyv!tL  
gas, ultrafine nanosize powders (UNP) has been $9O%,
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successfully synthesized as well. The UNPs have also STgYXA(  
been produced by pulsed wire discharge (PWD). For XRR`GBI  
the practical applications, highly repetitive pulsed power L\X2Olfz1  
generators have been developed using semiconductor @60/IE{-v  
switches such as MOS-FET, IGBT, and SI Thyristor. qluaop  
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14th IEEE International Power Conference全文数据，part 01 - part 16 5*7 \Yjk?  
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http://www.rayfile.com/files/3e501c26-a63b-11dd-8167-0014221b798a/ !RwOUCk  
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http://www.rayfile.com/files/a46912f0-a63c-11dd-994a-0019d11a795f/ ~eHu+pv  
[url=http://www.rayfile.com/files/d416c914-a63c-11dd-89a6-0019d11a795f/]http://www.rayfile.co .. -dsE9)&8DX  
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